FPD/SEMICON China 2018 Hall E7

FPD/SEMICON China 2018 Hall E7 1.7m 6m 3m 6 7734 Grandmak e 1.7m6 7631 Fujian Yongjing 6 7635 6 Shanghai Lieth 771 3 Sha 771 6 JAP 6 6 773 1 Attol 771 2 J-1.7m 7705 Exis Tech Sdn

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Overview of SEMI F47-0706

3 SEMICON® Japan 2006 What Changed? • Removal of 50ms, 50% Vnom Test Point. • Referencing of Test Durations are now presented only in Cycles – with specific values for 50 and 60 Hz. • Equipment must now pass at the test point levels rather than “above the defined line” • Compliance with the new SEMI F47-0706 is defined by passing three test points rather than compliance to a

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STEP: E142 Substrate Mapping and Device Traceability ...

©SEMI 2005 STEP: E142 Substrate Mapping and Device Traceability SEMICON West® 2005 San Francisco, California July 12, 2005

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2SC3284 - semicon.sanken-ele.co.jp

66 Silicon NPN Epitaxial Planar Transistor (Complement to type 2SA1303) Application : Audio and General Purpose Symbol VCBO VCEO VEBO I C IB PC Tj Tstg Ratings 150 150 5 14 3 125(Tc=25°C) 150 –55 to +150 Unit V V A A W °C

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SEMICON China 2018 Hall N5

SEMICON China 2018 Hall N5 1.7m 3m 3m 3m 3m 5443-1 5300 TooTec Co., 5215 Hanyung 5316 Nestek 5637 Lasertec China Co., Ltd 6 5509 Sanyo Denki Shanghai Co., Ltd

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HC InventoryList 201810~ xlsx - Hitachi Capital Corp

nov. 2018 tool code process equipment manufacturer model wafer size vintage 7519 test wafer prober_full auto accretech uf3000 300 2004 7520 test wafer prober_full auto accretech uf3000 …

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Picture: Sony - SEMI.ORG

10 POTENTIAL MICROLED BENEFITS •Low power consumption. •Perfect black + high brightness = High Dynamic Range (contrast). •Wide color gamut. •Long lifetime, environmental stability.

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“Photoneece” CS-series - toray.jp

2 2 Thickness ：0.3μm～1.2μm Resolution：Aspect ratio=3 Application：[Inner lens] [On-chip lens] Aqueous developable positive tone PSPI (Photo Sensitive Polyimide) with high R.I., good chemical resistance and high resolution.