Basic PECVD Plasma Processes (SiH based)

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completion of a clean process. Silane forms particles when it reacts with residual oxygen in the gas lines (remember all of the gas line up to the normally open, hardware interlock nupro valve is incorporated in the chamber vacuum and needs to de-gas at the end of a long clean run). Wait 30 minutes before running a deposition process using silane

  Saline