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Boron nitride

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9. Ion Implantation

www.cityu.edu.hk

boron was implanted into amorphous silicon without annealing. Table 9.1: Boron ranges in various materials. 100 keV boron implantation Material Symbol Density (g/cm3) R p (Å) p (Å) Silicon Si 2.33 2968 735 Silicon dioxide SiO 2 2.23 3068 666 Silicon nitride Si 3 N 4 3.45 1883 408 Photoresist AZ111 C 8 H 12 O 1.37 10569 1202

  Boron, Implantation, Nitride, Ion implantation

Common Ions and Their Charges - ScienceGeek.net

www.sciencegeek.net

boron C carbon nitride N3-oxide O2-fluoride F-neon Ne Al3+ aluminum Si silicon phosphide P3-sulfiide S2-chloride Cl-argon Ar helium He Zn2+ zinc In3+ indium Ge4+ germanium As3-arsenide selenide Se2-bromide Br-krypton Kr telluride Te2-Po2+ polonium(II) polonium(IV) Po4+ iodide I-xenon Xe astatide At-radon Ra

  Boron, Nitride

Covalent Bonding & Molecular Compounds Multiple Choice ...

content.njctl.org

Mar 01, 2013 · A) boron chloride B) boron trichloride C) monoboron chloride D) trichloro boron E) monoboron trichloride 22) The name of the binary compound CS 2 is _____. A) carbon sulfide B) monocarbon disulfide C) carbon disulfide D) carbon …

  Boron

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