Transcription of Advanced Process Control in Semiconductor Manufacturing
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Advanced Process Control in Semiconductor ManufacturingTom SondermanCostas SpanosOutline The Challenge Historical Perspective Measuring Variability The Importance of Metrology Controlling Variability Applied Concepts APC at AMD Modeling Variability Interaction of Design and Manufacturing Design for Controllability Future PerspectivesIntroduction Error budgets cannot keep up with shrinking dimensions. In the sub-100nm generations, Critical Dimensions (CDs) are hard to Control . 65nm features, have an error budget of +/- ~5nm. Often metrology offers about +/- 2nm precision!
Key Manufacturing Objectives Maximize Revenue Potential of Every Wafer “Zero Uncertainty” in the minds of our customers through consistent on-time
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