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Atomic Layer DepositionAtomic Layer Deposition …

Atomic Layer DepositionAtomic Layer Deposition (ALD)Erwin Kessels phase Deposition technologiesPhysical Vapor Deposition (PVD) sputtering Chemical Vapor Deposition (CVD) Energetic ions!Heat!/Applied Physics - Erwin KesselsgMore applications have stricter requirements growth and thickness control 2Hi hflit / conformality/step uniformity on large substrate temperatures/Applied Physics - Erwin KesselsVery demanding applicationsNanoelectronicsPhotovoltaics fProtective thin filmsFlexible electronics/Applied Physics - Erwin KesselsCMOS scaling in nanoelectronics??????graphenegrapheneAct ive AreaGateFi el dSpacersActive AreaGateFi el dSpacersActive AreaGateFi el dSpacers????????????Active AreaGateFi el dSpacersActive AreaGateFi el dSpacersActive AreaGateFi el dSpacersGe/IIIVGe/IIIV nanowiresnanowiresgpgpHfOmetal gatemetal gateFinFETFinFETL=35nmSiGeL=35nmL=35nmSi GestrainstrainHfO2high high -- timesilicidesilicideUSJUSJT imeeCourtesy of Marc Heyns, IMEC/Applied Physics - Erwin KesselsField-effect transistor: replacing SiO2by HfO232 nmThermally grown SiO2 Thermally grown SiO2/Applied Physics - Erwin KesselsPrecise Deposition of nanometer-thick Hf-based.

Atomic Layer DepositionAtomic Layer Deposition (ALD) Erwin Kessels w.m.m.kessels@tue.nl www.phys.tue.nl/pmp

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