Transcription of Basic Wafer Definitions - Virginia Semiconductor Inc.
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Basic Wafer Definitions - Virginia Semiconductor Inc.
Basic Wafer Definitions August 2003 Virginia Semiconductor , Inc. 1501 Powhatan Street, Fredericksburg, VA 22401 (540) 373-2900, FAX (540) 371-0371 , The article is a quick and simple reference to many Basic Wafer Definitions . For a complete, and very detailed listing of Wafer Definitions one is advised to review the published SEMI Specifications for silicon Wafers (SEMI), or other more detailed articles in the VSI Technology Library. Conductivity Type: Defines the type of charged-carrier in the crystal that is conducting electricity. n-type Si material having electrons as the majority current carriers. Electrons have negative charge (n). Doping with the impurities Phosphorous, Antimony and Arsenic creates n-type material. p-type - Si material having holes as the majority current carriers. Holes have positive charge (p). Doping with the impurity Boron creates p-type material. Resistivity: The resistance to current flow and movement of electron and hole carries in the silicon .
piece of silicon together (bonded wafers) to form the stack, or 2) by using a heavy oxygen ion implant of the wafer followed by annealing (often known as SIMOX).
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