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EVALUATION OF ADVANCED PRE-GATE CLEANINGS

EVALUATION OF ADVANCED PRE-GATE CLEANINGS C. Cowache, P. Boelen and I. Kashkoush AKrion 6330 Hedgewood Dr. 150 - Allentown PA 18106, USA P. Besson STMicroelectronics 850 Rue Jean Monnet - 38921 Crolles, France F. Tardif CEA Leti, 17 Rue des Martyrs - 38054 Grenoble Cedex 9, France. ABSTRACT In order to meet stricter wafer cleanliness requirements, emerging environmental concerns and more stringent cost-effectiveness criteria, wafer cleaning technology is moving slowly away from the conventional RCA-based processes. In this paper, the cleaning efficiency of different ADVANCED PRE-GATE cleaning processes, all carried out in the same Wet Bench is compared.

EVALUATION OF ADVANCED PRE-GATE CLEANINGS C. Cowache, P. Boelen and I. Kashkoush AKrion 6330 Hedgewood Dr. 150 - Allentown PA 18106, USA P. Besson STMicroelectronics 850 Rue Jean Monnet - 38921 Crolles, France F. Tardif CEA Leti, 17 Rue des Martyrs - 38054 Grenoble Cedex 9, France. ABSTRACT In order to meet stricter wafer cleanliness requirements, emerging environmental …

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