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Fabrication of antiscatter grids and collimators for X-ray ...
TECHNICAL PAPERF abrication of antiscatter grids and collimators for X-rayand gamma-ray imaging by lithography and electroformingOlga V. Makarova Guohua Yang Platte T. Amstutz Cha-Mei TangReceived: 16 July 2007 / Accepted: 3 January 2008 / Published online: 22 January 2008 Springer-Verlag 2008 AbstractCreatv MicroTech has developed unique fab-rication techniques to make high precision, high-aspect-ratio metal microstructures to custom specifications. Alithography based Fabrication method permits precise fab-rication of various microstructures. collimators andantiscatter grids with continuous, smooth, thin, parallel orfocused septa have been fabricated using deep X-ray andoptical lithography , combined with metal of high-aspect-ratio structures, especiallyof relatively large areas, presents many challenges: spe-cialized mask design and X-ray mask Fabrication ; resistpreparation, optimal exposure parameters, post-exposureprocessing, electroforming , polishing, and final , we present microstructures of various designs that wefabricated and describe the challenges that had to Introduc
TECHNICAL PAPER Fabrication of antiscatter grids and collimators for X-ray and gamma-ray imaging by lithography and electroforming Olga V. Makarova Æ Guohua Yang Æ
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