Transcription of Optics for EUV Lithography
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Optics for EUV LithographyJune 13th, 2018 Berkeley, CA, USADr. Sascha Migura, Carl Zeiss SMT GmbH,Oberkochen, Germany2018 EUVL Workshop2 Carl Zeiss SMT GmbH, Sascha Migura 2018 EUVL WorkshopJune 13th, 2018 Ernst Abbe in 1873k1is process factor is wavelengthNAis numerical apertureMoore s Law drivestherequirementson resolutionoftheopticalsystemdeterminesth eminimumfeaturesizeon a Zeiss SMT GmbH, Sascha Migura 2018 EUVL WorkshopJune 13th, 2018100080060035025018013090654532221611 868890929496980002040812141610061718 Design rule / Resolution(nm)Increasing sequence down NA up k1downhas been repeated several times during the last 25 Zeiss SMT GmbH, Sascha Migura 2018 EUVL WorkshopJune 13th, 2018intermediate focuscollectorreticle (mask)waferplasmailluminatorfield facet mirrorpupil facet mirrorprojectionopticssourceEUV optical train (schematic).
2018. EUV program at ZEISS: Continuously improving resolution. First shipment. ... 2018 30 Construction status. October 2017. Extensions for High-NA EUV optics manufacturing are under construction. Carl Zeiss SMT GmbH, Sascha Migura 2018 …
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