Transcription of Semiconductor Wafer Edge Analysis - prostek.com
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Semiconductor Wafer Edge Analysis /1 Semiconductor Wafer Edge Analysis Chapman Technical Note-TW-1 Rev-98-07 Semiconductor Wafer Edge Analysis /2 Introduction The reason for evaluating Semiconductor Wafer edge microroughness is that edge defects can sometimes adversely affect Semiconductor performance. Problems range from features that trap liquid or airborne particles to rough surface protrusions that may become detached and release silicon particles during processing. These problems have led to an ASTM standards effort that includes the definition of a standard for the measurements of the surface topography of Semiconductor edges .
Semiconductor Wafer Edge Analysis/2 Introduction The reason for evaluating semiconductor wafer edge microroughness is that edge defects can sometimes adversely affect semiconductor performance.
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Semiconductor industry, New Semiconductor Industry Collaboration Platform, Semiconductor, VALUING PATENTS AND INTANGIBLE ASSETS IN THE, VALUING PATENTS AND INTANGIBLE ASSETS IN THE SEMICONDUCTOR INDUSTRY, Industry, Dimension Measurement System for Semiconductor Processes, Hazardous substances in semiconductor manufacturers, Semiconductor Packing Methodology Rev. C