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Vertical Diffusion and CVD tool for Next-generation Semiconductor devices 88 Vertical Diffusion and CVD tool for next -generationSemiconductor DevicesOVERVIEW: In regard to recent patterns in semiconductor fabrication, twofeatures are clear: mass production of a few product varieties, such asDRAMs and MPUs, or small amount production of many product varieties,such as system LSIs. From now onwards, however, demands for shorteningthe fabrication period will grow. In the case of large batches (processing100 to 125 wafers), the standby time needed for output adjustment getslonger, thereby lengthening the fabrication period significantly. Moreover,on top of increases in gas generation and power consumption, it is also aproblem that the quantity of dummy wafers consumed in making up forseveral defective wafers also increases, and the CoO rises dramatically.
Vertical Diffusion and CVD Tool for Next-generation Semiconductor Devices 90 (1) high-precision temperature control, (2) high-grade processing,
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