Transcription of X-ray thin-film measurement techniques
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X-ray thin-film measurement techniques
1. IntroductionThis is the fifth article in the series of X-ray thin-filmmeasurement techniques . The second, third and fortharticles of this series, previously published in the RigakuJournal, describe out-of-plane, high-resolution and in-plane XRD measurements to obtain crystallographicinformation on crystal size, lattice strain and orientationrelationship of a thin-film material. These measurementshave been based on the premise of a crystalline thin the other hand, the X-ray reflectivity (XRR) measurement is not a technique to evaluate diffractionphenomenon. The XRR measurement techniquedescribed in this article is used to analyze X-rayreflection intensity curves from grazing incident X-raybeam to determine thin-film parameters includingthickness, density, and surface or interface article will provide an overview of the principles ofX-ray reflectivity, measurement procedures, and analysismethods.
The angular divergence of an incident X-ray beam can be controlled by incident X-ray optical systems. Therefore, X-ray optics must be selected on the basis of ... measuring X-ray reflectivity must be increased. Table 1 provides an overview of the optics used in reflectivity measurement and guidelines for film thickness measurement.
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