Transcription of X-ray thin-film measurement techniques
{{id}} {{{paragraph}}}
Example: bankruptcy
X-ray thin-film measurement techniques
1. IntroductionThis is the fifth article in the series of X-ray thin-filmmeasurement techniques . The second, third and fortharticles of this series, previously published in the RigakuJournal, describe out-of-plane, high-resolution and in-plane XRD measurements to obtain crystallographicinformation on crystal size, lattice strain and orientationrelationship of a thin-film material. These measurementshave been based on the premise of a crystalline thin the other hand, the X-ray reflectivity (XRR) measurement is not a technique to evaluate diffractionphenomenon. The XRR measurement techniquedescribed in this article is used to analyze X-rayreflection intensity curves from grazing incident X-raybeam to determine thin-film parameters includingthickness, density, and surface or interface article will provide an overview of the principles ofX
the vertical direction is dependent on the height-limiting slit. However, the irradiated width should be approximately one-and-a-half times the height of the height limiting slit. 3.3. Sample alignment In the sample alignment process, the first step is …
Loading..
Tags:
Information
Domain:
Source:
Link to this page:
Please notify us if you found a problem with this document: