D 薄膜、微小領域の機械物性評価技術

1 MEMS nm nm ( ) 1 20 2 3 4 5 15 ( ) D D 1 R D 52(Sep. 2002) 2 Ni/Pd/Au ( 1 ) (2012) 3 (2012) 4 , Vol51( ) , 5 Sam Zhang, Deen Sun, Yongqing Fu, Hejun Du : Toughness measurement of thin films : a critical review, Surface & Coatings Technology, 198(2005), 6 Oliver and Pharr :An improved for determining hardness and elastic modulus using load and displacement sensing indentation experiments, J.

2 Mater. Res, (1992) , 1 1 Berkovich P Ap 6 2 - hc 2 S : Ap hc 1 1 f hc Ap= hc Ap Er 2 S 2 2 Es 2 Er Ei i s 3 3 Ei i s Es ~ 0.

3 2 5 ~ 5% 2 CSM 3 74 GPa 165 GPa 10 , 1 - 2 hcht h (nm) SPmax P (mN) 3 Continuous Stiffness Measurement CSM S 6 7 S Ap 4 Si Ni 300nm CSM Ni 6 5 nm 2 0 nm

4 C S M nm 1 m 1-2 ~ 11 , 5 HV40 HV100 HV500 HV900 IF :IF DP-FM IF IF :3gf 10gf 50gf DP-FM:10gf 50gf 1 1 GPa HV80 1:1 1-3 CSM m~ m 6 7 3 GPa 8 m : 50nm-70nm.

5 20nm-25nm 10 5 6 7 SEM 8 7 2008 CSM 4 h (nm) 164 GPa H (GPa) E (GPa)005501001501020015050100150200250 GPa y = + HV kgf/mm 1000900800700600500400300200000002468101 214 -10gf IF-3gf IF-10gf IF-50gf DP-FM-3gf DP-FM-10gf DP-FM-50gf ( -10gf) h (nm) h (nm) H (GPa) E (GPa)00246508100101501220000505010010015 0150200200250250300300 153 GPa D 2-1 9 / 8 nm~ m DLC nm~ nm m 2-2 ITO ITO 200nm 700nm

6 10 50 m SEM/EDX ITO 11 ITO 175 m SEM/EDX ITO , 12 , 10 ITO 11 D 2 8 SAICAS 1 1995 4 9 SEM-EDX SEM SEM-EDX SEM