一) PECVD 使用手冊 - ndl.narl.org.tw

1 ( ) PECVD A (1) (2) (3) (4) : (5) : (6607) (6625) B (1) ( ) (2) pump ( pump ) (3) Locoal Scrubber ( ) (4) C (1) PC2000 ( user) (2) Load Lock (3) Load Lock [Vent] wafer ( 6 ) (4) Load Lock [Evacuate] ( load lock pump valve ) (5) Process [Recipe] [Automatic] [manual] [clean] (6) [Recipe] [load] recipe recipe recipe [Edit] (7)

2 Recipe [Run] (8) wafer load lock (9) load lock load lock [Vent] wafer (10) load lock [Evacuate] : PECVD SiO2,Si3N4, -Si, PECVD 300 PECVD 400 ( 6 ) HF ( 10) Si PECVD 10um CVD ( ) ( ) ICP Etcher A (1) (2) (3) (4) : (5).

3 (6607) (6625) B (1) ( ) (2) pump ( pump ) (3) Locoal Scrubber ( ) (4) (5) ( ; ) (6) ( 10 ) C (1) PC2000 ( user) (2) Load Lock (3) Load Lock [Vent] wafer (4) Load Lock [Evacuate] ( load lock pump valve ) (5) Process [Recipe] [Automatic] [manual] [clean] (6)

4 [Recipe] [load] recipe recipe recipe [Edit] (7) ICP (A)clean chamber-First recipe ( recipe ) (8) RF( 10) ICP( 25) 8 [stop] wafer load lock 2~3 (9) wafer load lock (10) load lock load lock [Vent] wafer (11) load lock [Evacuate] (12) (13) : ( wafer ) ( ) ( PECVD ) Si - ICP Si ( O2, SF6, Ar) ( Cl2, BCl3)

5 RF power 150W ICP power 3000W RF power 10W , ICP power 25W 8 wafer load lock 8 Si SF6 SiO2 C4F8 Si3N4 STS etcher ( ) ICP ( ) Si 100um wafer ICP CVD ICP