Transcription of Photomask Japan 2018
1 Photomask Japan 2018 The 25th Symposium on Photomask and Next Generation Lithography Mask Technology 25 Photomask Japan 2018 Policy & Outline (PMJ) SPIE Photomask Japan 2018 1. 25 Photomask Japan 2018 (The 25th Symposium on Photomask and Next Generation Lithography Mask Technology) 2. (PMJ) SPIE BACUS EMLC 105-8335 3-23-1 JTB 03-5657-0777 FAX 03-3452-8550 E-mail URL 3. 4. SEMI 5. 2018 4 18 ( ) 20 ( ) 6.
2 25 IoT nm nm EUV EUVL DSA Directed Self-Assembly EDA PMJ SPIE BACUS EMLC 2018 4 7 1 EUVL / EB/ / 2 EUVL / / 3 OPC & MDP (Mask Data Preparation)
3 Design flow & Data modeling DTCO 4 DSA 5 NIL NGL NGL 6 FPD / 7 8. (1) EDA ( ) 6 8 3 4 40 40 ( ) 30 (2) (3) (4) 250 150 (5) Digest of Papers SPIE Proceedings Digital Library 9. (1) ALITECS D2S ) (2) ) ) ) SEMI ) ) ) ) ) HOYA) ) U.
4 Behringer UBC Microelectronics EMLC P. Chen TMC) B. J. Grenon RAVE) W. Montgomery MWM Strategic Development Solutions LLC ) (3) ) ) ) HOYA) ) ) ) ) D2S) HOYA ) ) ) P.
5 Buck Mentor Graphics) T. Faure GLOBALFOUNDRIES) F. Kalk Toppan Photomasks) I. Kapilevich (Applied Materials AGS EPG) Photronics) B. G. Kim Samsung Electronics) J. Lin TSMC) P. Schiavone (Aselta Nanographics) G. Zhang (Intel) 4 ) [ ] [ ] ) [ ] [ ] ) [ ] [ ] ) [ ] ) [ ] HOYA) [ ] ) [ ] ) [ ] ) [ ] ) [ ] ) 50 10.
6 (1) (2) 105-8335 3-23-1 JTB 03-5657-0777 FAX 03-3452-8550 E-mail URL (3) 2018 3,000,000 2017 5 1 2018 4 17 Photomask Japan 11 105-8335 3-23-1 JTB 03-5657-0777 FAX 03-3452-8550 E-mail URL
