Plasma Etching System and its Applications to 45–32-nm ...

Plasma Etching System and its Applications to 45–32-nm Leading-edge Devices 58 accomplished by applying coaxially installed turbo molecular pumps, symmetrically designed electrodes,

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LITMAS® RPS 1501 AND 3001 - advancedenergy.com

The Litmas® Remote Plasma Source (RPS) delivers high concentrations of reactive gas species to enable advanced process applications, such as thin- film …

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Materials and Components for Flat Panel Display Applications

Materials and Components for Flat Panel Display Applications 34 several microns to several hundred microns in diameter, and are used in CCD (charge-coupled device)

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Compendial Effort to Revise Packaging Material Standards ...

Building safety into a system by using well -characterized and safe materials of construction (Quality by Design). The testing required to select and qualify a packaging system is

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Products for Semiconductor / Display Industry - HORIBA

We provide a wide range of an to meet the requirements Semiconductor Process Manufacturing Process Major Products Manufacturing Process Disp Etching Ion Implantation Inspection/Measurement

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Plasma Cleaning of Surfaces en - jhv-vac.com

From Vacuum Technology & Coating 2008 Page 1 of 11 Edited by Jinghong Vacuum Thin Film （Shenzhen） Co., Ltd / www.jh-vac.com Plasma Cleaning of Surfaces

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Sputter Coating Technical Brief - IIT Kanpur

The components and packages described in this document are mutually compatible and guaranteed to meet or exceed the published performance specifications.

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SYLGARD® 567 Primerless Silicone Encapsulant

SYLGARD® 567 Primerless Silicone Encapsulant € Product Information TYPICAL PROPERTIES Specifications writers: These values are not intended for use in preparing specifications.

USES AND EMISSIONS OF LIQUID PFC HEAT TRANSFER …

USES AND EMISSIONS OF LIQUID PFC HEAT TRANSFER FLUIDS FROM THE ELECTRONICS SECTOR Office of Air and Radiation Office of Atmospheric …

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