Photolithography - Wake Forest University

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– Double patterning techniques • The other way is to decrease the wavelength of the light used in patterning. – 1985: Mercury lamp i-line (365 nm) – 2002: ArF laser (DUV: 193 nm) – 2011 (?): Tin Plasmas (EUV: 13.5 nm) – New wavelengths require new optics and materials

  Material, Technique, Patterning, Photolithography, Patterning techniques