Low Pressure RF Plasma Sources for Industrial Applications ...

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V. Volynets et al, J. Vac. Sci. Technol. A26, 406, 2008 . 14 VHF CCP problems I. Low frequency bias significantly affects plasma parameters II. Standing surface waves (λ ... Remote plasma sources Lighting . Skin Effect, δ ≡ E(dE/dx)-1 In ICP, the rf current forms closed loop within plasma without rf sheath ...

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