Diffraction Based Overlay Metrology for Double Patterning ...

22 Diffraction Based Overlay Metrology for Double Patterning Technologies Prasad Dasari 1, Jie Li 1, Jiangtao Hu 1, Nigel Smith 1 and Oleg Kritsun 2 1Nanometrics 2Globalfoundries USA 1. Introduction 193nm optical immersion lithography is approa ching its minimum practical single-exposure

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