Transcription of Certain UCLA Abutment - Biomet 3i
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8 Certain UCLA AbutmentWaxing SleeveChamfer MarginImproved CylinderRetention DesignReduced Collar OSSEOTITE Certain Line of restorative componentsincludes a newly designed UCLA Abutment . This new designprovides greater predictability and more flexibility for laboratorytechnicians when waxing and casting implant level restorations. Improved Cylinder Retention DesignThe new design incorporates machined vertical grooves thatreduces the potential for miscasts due to the smoother alloyflow onto the gold alloy cylinder during casting. The verticalgrooves provide mechanical retention and are designed toeliminate the problem on previous UCLA designs of the alloystopping on the horizontal retention instead of flowing to themargin (fig. 10). Chamfer MarginThe chamfer margin design provides a smooth transitionfrom thegold alloy cylinder to the cast alloy at the junction.
8 Certain® UCLA Abutment Waxing Sleeve Chamfer Margin Improved Cylinder Retention Design Reduced Collar Height 4mm 0.25mm 4.5mm 4.1mm 5mm 5.5mm 6.5mm 6mm 4.1mm 5mm 6mm The OSSEOTITE® Certain Line of restorative components includes a newly designed UCLA Abutment.
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