Transcription of Chapter 1 Introduction to Chemical Vapor Deposition (CVD)
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2001 ASM International. All Rights Reserved. Chemical Vapor Deposition (#06682G). Chapter 1. Introduction to Chemical Vapor Deposition (CVD). J. R. Creighton and P. Ho Sandia National Laboratories Box 5800, MS0601. Albuquerque, NM 87185-0601. Introduction The handbook by Pierson3 contains a very useful discussion of specific materials and CVD. Chemical Vapor Deposition (CVD) is a processes, as does the book by The widely used materials-processing technology. books by Hitchman and Jensen, 5 and by The majority of its applications involve applying Sherman, 6 concentrate more on silicon solid thin-film coatings to surfaces, but it is also microelectronics applications, while the books used to produce high-purity bulk materials and by Stringfellow7 and by Jones and O'Brien8.
Chapter 1 Introduction to Chemical Vapor Deposition (CVD) J. R. Creighton and P. Ho Sandia National Laboratories P.O. Box 5800, MS0601 Albuquerque, NM 87185-0601
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Chapter 13 Rates of Reaction, Reaction Rates, Of reaction, Of Reaction Kinetics for Chemical Reaction, Chapter, Of Reaction Kinetics for Chemical Reaction Engineering, Kinetics: The Rates of Reactions – the reaction, Reaction, Heterogeneous Catalysis, Introduction to Chemical Engineering Processes, Chapter 1 Functions and Limits, Chapter 1 - Functions and Limits