Transcription of CMOS image sensor fabrication technologies Pixel design ...
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LectureNotes5 CMOSI mageSensor DeviceandFabrication cmos imagesensor fabricationtechnologies Pixeldesignandlayout Imagingperformanceenhancementtechniques Technologyscaling,industrytrends Microlens Color lterarrayEE392B:DeviceandFabrication5-1 ModernCMOSD eviceStructureEE392B:DeviceandFabricatio n5-2 ImagingIs Di erentfromDigitalLogicFeaturesDigitalLogi cImagingSilicideImprovescontactresistanc eAbsorbslight{ low photosensitivityIncreasedjunctionleakage STIE nablestighterdesignrulesLeadsto largerdark currentduetodefectsfromstressShallow junctionReducesshort-channele ectReducesquantume ciencyformediumto longwavelengthlightLower power supplyvoltageReducespower consumption.}
Most CMOS image sensors uses 0.18 m CMOS 3.3V, thick oxide transistors for the pixel Pinned photodiode for CMOS image sensors (at low voltage) Cu backend to reduce dielectric stack height Migration to 0.13 m CMOS may need substantial process changes Pixel size reduction to 2 m driven mostly by cost EE 392B: Device and Fabrication 5-35
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