Transcription of CMOS Manufacturing Process
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Digital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOSM anufacturingProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOS ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessA Modern CMOS Processp-welln-wellp+p-epiSiO2 AlCupolyn+SiO2p+gate-oxideTungstenTiSi2 DualDual--Well TrenchWell Trench--Isolated CMOS ProcessIsolated CMOS ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit Under DesignThis two-inverter circuit (of Figure in the text) will bemanufactured in a twin-well Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit LayoutDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessThe Manufacturing ProcessFor a great tour through the Process and its different steps, a complete walk- through of the Process (64 steps), check theBook web-pageDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing Processoxidationopticalmaskprocessstepph otoresistcoatingphotoresistremoval (ashing)spin, rinse, dryacid etchphotoresist stepper exposu
For a complete walk-through of the process (64 steps), check the Book web-page. ... Silicon base material (b) After oxidation and deposition of negative photoresist (c) Stepper exposure Photoresist SiO 2 ... Create contact and via windows Deposit and pattern metal layers.
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