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CMOS Manufacturing Process - University of California ...

Digital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOSM anufacturingProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOS ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessA Modern CMOS Processp-welln-wellp+p-epiSiO2 AlCupolyn+SiO2p+gate-oxideTungstenTiSi2 DualDual--Well TrenchWell Trench--Isolated CMOS ProcessIsolated CMOS ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit Under DesignThis two-inverter circuit (of Figure in the text) will bemanufactured in a twin-well Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit LayoutDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessThe Manufacturing ProcessFor a great tour through the Process and its different steps, a complete walk-through of the Process (64 steps), check theBook web-pageDigital Integrated CircuitsEE141 Manufacturing

Digital Integrated Circuits Manufacturing Process EE141 oxidation optical mask process step photoresist photoresist coating removal (ashing) spin, rinse, dry acid etch photoresist stepper exposure development Typical operations in a single photolithographic cycle (from [Fullman]). Photo-Lithographic Process

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