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High-k/Metal Gate Technology - 東京工業大学

VLSI textbook Finally, there appears to be a fundamental limit 10 of approximately quartermicron channel length,where certain physical effects such as the tunneling through the gate oxide and fluctuations in the positions of impurities in the depletion layers begin to make the devices of smaller dimension unworkable.

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  High, Technology, Metal, Gate, Vlsi, High k metal gate technology

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