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Lapping and Polishing Si Die and Wafers

/ 8/9 : PurposeThe primary aim of this report is to describe and compare various Lapping and Polishing techniques available for preparingsmooth, highly polished surfaces of small Si Wafers and die. Lapping and Polishing techniques using the Model 920 Lapping and Polishing Machine and the Model 155 Lapping and Polishing Fixture will be investigated to determine thebest method for preparing these types of materials. Comparison of free abrasive Lapping techniques, cloth polishingtechniques, and paper techniques will be done based on preparation time, surface smoothness and quality, and ease : ExperimentsFor this experiment several different samples of a Si wafer were obtained for Lapping and Polishing experiments. Thewafer pieces were cleaved into 10 mm x 20 mm rectangles as well as smaller 5 mm x 5 mm die sized squares.

46.DOC / 8/9/99 1.0: Purpose The primary aim of this report is to describe and compare various lapping and polishing techniques available for preparing

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