Transcription of Lithography Using ASML Stepper - diyhpl.us
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Lithography Using ASML Stepper - diyhpl.us
Page 1 April 28, 2014 Dr. Lynn FullerLithography Using ASML StepperPage 1 ROCHESTER INSTITUTE OF TECHNOLOGYMICROELECTRONIC ENGINEERINGR evision Date: 4-28-2014 to ASML PAS 5500 Wafer Alignment and ExposureDr. Lynn Fuller Stephanie BolsterWebpage: and Microelectronic EngineeringRochester Institute of Technology82 Lomb Memorial DriveRochester, NY 14623-5604 Tel (585) 475-2035 Email: Webpage: April 28, 2014 Dr. Lynn FullerLithography Using ASML StepperPage 2 DEFINITIONSASML (today) ASM Lithography (1988) ASM International and Royal Phillips (1984)PAS Phillips Automatic Stepper as in ASML PAS 5500/200 Reticle quartz plate with single layer of chip layout (or array) at 5X actual size (also called photomask)PM primary marks (same design for mask and wafer alignment)SPM scribe line primary marksNA-numerical aperture -sigma or coherencyDOF depth of focusREMA Reticle Masking SystemPage 2 April 28, 2014 Dr. Lynn FullerLithography Using ASML StepperPage 3 OUTLINEI ntroductionPAS 5500 SpecificationsStage AccuracyReticle Specifications and AlignmentExposure DoseWafer AlignmentOverlay MeasurementReticle and Wafer OrientationUser InterfaceMaterial HandlingBatch ControlCoat and Develop TrackStepper JobsReferences April 28, 2014 Dr.
Lithography Using ASML Stepper Page 4 INTRODUCTION Overlay (alignment) is as important as resolution in lithography. Modern CMOS integrated circuits have ~ 30 layers to be aligned. The RIT SUB-CMOS processes use up to 15 layers. Alignment marks are placed on the wafer at the beginning of the process
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