Transcription of Photolithography Overview for MEMS
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Photolithography Overview for MEMS
Photolithography Overview Photolithography Overview for MEMSfor MEMS Knowledge ProbeKnowledge Probe Photolithography Overview PKPhotolithography Overview PK ActivityActivity TerminologyTerminology ActivityActivity Resist ThicknessResist Thickness Participant GuideParticipant Guide Southwest Center for Microsystems Education (SCME) University of New Mexico MEMS Fabrication Topic Photolithography Overview for Microsystems Knowledge Probe (Pre-Quiz) Shareable Content Object (SCO) This SCO is part of the Learning Module Photolithography Overview Target audiences: High School, Community College, University Support for this work was provided by the National Science Foundation's Advanced Technological Education (ATE) Program through Grant #DUE 0902411. Any opinions, findings and conclusions or recommendations expressed in this material are those of the authors and creators, and do not necessarily reflect the views of the National Science Foundation.
Expose - The photoresist is exposed using a light source, such as Near UV (Ultraviolet), Deep UV or X-ray. Develop - The exposed photoresist is subsequently dissolved with a chemical developer. The type of photoresist (positive or negative) determines which part of the resist is dissolved. Photolithography vs. Photography
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