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Resists And Developers
Found 2 free book(s)
Polypropylene Chemical Resistance Guide - HMC Polymers
www.hmcpolymers.comIt resists most strong mineral acids and bases, but, like the other polyoleËšns, it is subject to attack by oxidizing agents. ... Developers (photographic) A A - Dibutyl phthalate 100 A B D Dichloroethylene 100 A - - Diethanolamine 100 A A - Product enquiries: sales@hmcpolymers.com
AZ 5200-E Photoresist - MicroChemicals
www.microchemicals.comOriginal i-line resists Various viscosity grades for a multitude of applications. Sensitive in i-line and g-line High thermal stability. Can be developed in a variety of metal ion free and inorganic developers (with and without surfactants) Can be used in a positive mode and with a special image reversal process.