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Advanced FinFET Process Technology
AIST, IEEE EDL 2010 Main Cause Dimension variation sources are negligible Main cause of the V ... SOI Conf, 2011, 7.1. 23 LSTP15nm LSTP22nm Obtained Avt meets 22-nm-node SRAM requirement For 15nm and beyond, Avt should be further reduced . National Institute of Advanced Industrial Science and Technology 1. Introduction
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Lecture 12: DRAM Basics
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