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Basic PECVD Plasma Processes (SiH based)

Basic PECVD Plasma Processes (SiH based)

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Basic PECVD Plasma Processes (SiH 4 based) PECVD SiNx: SiH ... vacuum and needs to de-gas at the end of a long clean run). Wait 30 minutes before running a deposition process using silane after finishing a clean. Small particles less than 5um which appear in concentrated clusters.

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