BEOL Interconnect Innovations for Improving Performance
Feb 23, 2017 · •A combination of high etch selectivity ESL and thin hermetic Cu barrier enables DB scaling •A high selectivity ESL can provide better control of unlanded via over etch and enable TiN wet removal with protected via bottom • Replacing SiCN with AlN + SiCO is a offers a highly conformal stack with high etch selectivity, k eff
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nccavs-usergroups.avs.orgcomponents packaging and assembly at Philips Semiconductor, Linear Technology and Corwil Technology. Prior to joining Promex, she was Package Assembly Manager at Silanna in Australia.
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