Chapter 1.10 - Miscellaneous Etchants
Add a small amount of Zn powder (on edge of a spatula). Put the wafer in the solution for about 1 min. Watch for turbidity of the ITO. Transfer the wafer to another beaker containing conc. HCl (no dilution), for about 1 min. Take the wafer out and check if all the film was etched. Return to first solution if needed, at 50 degrees. HCl:HNO
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Miscellaneous Plating Solutions
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