Diffraction Based Overlay Metrology For Double Patterning Technologies

Diffraction Based Overlay Metrology for Double Patterning ...

22 Diffraction Based Overlay Metrology for Double Patterning Technologies Prasad Dasari 1, Jie Li 1, Jiangtao Hu 1, Nigel Smith 1 and Oleg Kritsun 2 1Nanometrics 2Globalfoundries USA 1. Introduction 193nm optical immersion lithography is approa ching its minimum practical single-exposure

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