Search results with tag "Resist defects"

Spin-coating of Photoresists - MicroChemicals

the resist fi lm becomes suffi ciently stable to suppress its elapsing during the handling of the wafers after coating. Advantages The spin-coating of the resist typically takes only 10 - 20 sec- ... Inhomogeneous Resist Film Thickness and Resist Defects Textured Substrates.

  Defects, Sisters, Resist defects