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Understandillg hydrogen silsesquioxane-based dielectric ...
www.felcomllc.comUnderstandillg hydrogen silsesquioxane-based dielectric film processing Mark J. Loboda, George A. Toskey, Dow Coming Corp., Midland, Michigan . Hydrogen silsesquioxane (HSQ) resin has demonstrated unique performance as a precursor for the formation of interlayer dielectrics (ILDs) used in manufacturing ICs with multilevel metallization schemes.