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Basic Mechanical and Thermal Properties of Silicon

Basic Mechanical and Thermal Properties of Silicon Virginia Semiconductor, Inc. 1501 Powhatan Street, Fredericksburg, VA 22401 (540) 373-2900, FAX (540) 371-0371 , A Introduction This paper outlines some of the Basic Mechanical and Thermal Properties of Silicon . B Crystalline Structure and Elastic Properties Three values for the lattice parameter of pure Silicon at C are given below. The values were determined in independent studies through X-ray and optical interferometry (XROI). a= +/- fm [2] a= +/- fm [3] a= +/- fm [4] The value of the linear Thermal expansion coefficient ( (T)) is given by the following expression: (T) = ( {1- exp[ x 10-3 (T 124)]} + x 10-3T) x 10-3 K-1 [1] where T is the absolute temperature expressed in Kelvin and valid for values of T between 120 K and 1500 K. At C the recommended value is = ( +/- ) x 10-6 K-1 The lattice parameter at T K is given by a(T) = a0 [1] () d1+ where a0 is the lattice parameter at K.

Basic Mechanical and Thermal Properties of Silicon Virginia Semiconductor, Inc. 1501 Powhatan Street, Fredericksburg, VA 22401 (540) 373-2900, FAX (540) 371-0371

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Transcription of Basic Mechanical and Thermal Properties of Silicon

1 Basic Mechanical and Thermal Properties of Silicon Virginia Semiconductor, Inc. 1501 Powhatan Street, Fredericksburg, VA 22401 (540) 373-2900, FAX (540) 371-0371 , A Introduction This paper outlines some of the Basic Mechanical and Thermal Properties of Silicon . B Crystalline Structure and Elastic Properties Three values for the lattice parameter of pure Silicon at C are given below. The values were determined in independent studies through X-ray and optical interferometry (XROI). a= +/- fm [2] a= +/- fm [3] a= +/- fm [4] The value of the linear Thermal expansion coefficient ( (T)) is given by the following expression: (T) = ( {1- exp[ x 10-3 (T 124)]} + x 10-3T) x 10-3 K-1 [1] where T is the absolute temperature expressed in Kelvin and valid for values of T between 120 K and 1500 K. At C the recommended value is = ( +/- ) x 10-6 K-1 The lattice parameter at T K is given by a(T) = a0 [1] () d1+ where a0 is the lattice parameter at K.

2 The second order lattice constants are related by [5] ii = C11 ii + C12 ( jj + kk) ii = 2C44 ij (i j) where represents stresses and represents elastic strains. The three constants at room temperature and atmospheric pressure are given below [6] C11 = x 1011 Pa C12 = .6394 x 1011 Pa C44 = .7951 x 1011 Pa Between 150 K and 1000 K the decrease of the Cij with increasing temperature is fairly linear and follows these rates: = x 10-5 K-1 [7] 1 dC = x 10-5 K-1 [8] C dT11 11 = x 10-5 K-1 [7] C dT112 dC12 = x 10-5 K-1 7] = x 10-4 K-1 [8] C dT144 dC44 = x 10-5 K-1 [8]

3 For further information on third order elastic constants and the effects of doping see [6]. C Thermal Properties Table 1 Thermal Expansion Coefficient [1] T (K) (10-6 K-1) T (K) (10-6 K-1) T (K) (10-6 K-1) 5 x 10-4 180 700 10 x 10-3 200 800 20 x 10-2 220 900 40 240 1000 60 260 1100 80 280 1200 100 300 1300 120

4 400 1400 140 500 1500 160 600 1600 Table 2 Melting Temperatures [1] Temperature ( C) 1408 1410 1412 1414 1416 Number or Reports 1 1 7 8 3 Table 2 summarizes the reported melting points since 1948 of Silicon . The melting point is extremely difficult to determine due to the calibration of the machinery and also the fact that molten Silicon is highly reactive and most impurities serve to depress the melting point. The mean of the data given above is C with a standard error of degrees. Since the error in these measurements is negative, the best value to use would be one slightly higher than the mean, such as C.

5 [1] Table 3 Thermal Conductivity Values (Above 200 K) [9] T (K) K (W cm-1 K-1) T (K) K (W cm-1 K-1) 200 1000 300 1100 400 1200 500 1300 600 1400 700 1500 800 1600

6 900 1681 Table 4 Thermal Conductivity Values (Below 200 K) [10] T (K) K (W cm-1 K-1) T (K) K (W cm-1 K-1) 150 20 100 10 50 8 40 6 30 4 2 Table 4 Maximum Thermal Conductivity Versus Concentration of Boron

7 Impurities [1][10] Thermal Conductivity Boron Concentration (cm-3) Maximum (W cm-1 K-1) Temperature (K) Sample cross-section (mm2) x 1013 48 22 x x 1014 43 25 x x 1014 38 26 x x 1015 43 25 x x 1015 33 27 x x 1016 18 37 x Table 5 Thermal Diffusivity (Above 300 K)

8 [11] T (K) D(cm2 s-1) T(K) D(cm2 s-1) 300 800 400 900 500 1000 600 1200 700 1400 Table 6 Thermal Diffusivity (Below 300 K) [12] T (K) D(cm2 s-1) T(K) D(cm2 s-1) 50 100 60 150 70 200 80 250 90 For information on the heat for fusion for Silicon , see [13][14] For information on the surface tension of liquid Silicon , see [15]

9 D Conclusion This paper contained information on Basic Mechanical and Thermal Properties of Silicon . E References [1] R. Hull [ Properties of Crystalline Silicon (INSPEC, London, 1999)] [2] D. Windisch, P. Becker [ Phys. Status Solidi A (Germany) (1990) ] [3] G. Basile, A. Bergamin, G. Cavagnero, G. Mana, E. Vittone, G. Zosi [Phys. Rev. Lett. (USA) (1994) p. 3133] [4] H. Fujimoto, K. Nakayama, M. Tanaka, G. Misawa [Jpn. J. Appl. Phys. (Japan) (1995) ] [5] C. Kittel [Introduction to Solid State Physics 4th Edn (Wiley, 1971) ] [6] Hall [ Phys. Rev. (USA) (1967) ] [7] [ Landolt-Bornstien Numverical Data and Functional Relationships in Science and Technology, New Series, Ed. Hellwidge (Springer Verlag, Germany, 1979) vol. 17 and 22] [8] Burenkov, Nikanorov [Sov. State (USA) (1974) ] [9] Glassbrenner, Slack [ Phys. Rev. (USA) (1964) ] [10] Holland, Nueringer [ Proc.]

10 Int. Conf. Physics if Semiconductors, Exeter, England, 1962 (Inst. Phys., Bristol, 1962) p. 474] [11] B. Abeles, Beers, Cody, Dismukes [Phys. Rev. (USA) (1962) ] [12] P. Turkes [ Phys. Status Solidi A (Germany) (1983) ] [13] Hultgren et al [ Selected Values of Thermodynamic Properties of Metals and Alloys (Wiley, New York, 1968)] [14] Hultgren et al [ Selected Values of Chemical Thermodynamic Properties of Elements (Wiley, New York, 1973)] [15] Hardy [ J. Cryst. Growth (Netherlands) (1984) ]


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