厚膜レジストにおけるプリ ... - ltj.co.jp

1 Improved Resolution of Thick Film Resist (Effect of Pre-Bake Condition) Yoshihisa Sensu and Atsushi Sekiguchi 2 SEM 125 C/7 N2.

2 , , N2, 1. /MEMS(Micro Electro Mechanical Systems) TAB(Tape Bonding) COG(Chip On Glass) CSP(Chip Scale Package) [1] IC [2] [3] (DNQ) N2 N2 N2 N2 [3] N2 N2 3 C 1 LITHOTRAC[3] ( PMER P-LA900PM)

3 Si 22 m C 30 [4] 80 C 95 C 110 C 125 C 140 C 5 7 9 1 80 C 5 80-5 Quintel UL7000 [4] 350nm 450nm TMAH ( PMER P7G)23 C 15 m (Line Space 1 1) i 10 m 1 1 (Eop) SEM S-4000 RDA[5] 950nm TMAH 2000mJ/cm2 10 4 RDA SOLID-C[6] [7] 1 1 m (Line Space 1 1)

4 10 m Line Space 1 1 RDA FT-IR PAGA-100[8] GC-MS PAGA-100 Propylene Glycol Monomethyl Ether Acetate ( 146 C PGMEA (Ocean Optics, Inc. OOIBase32) 2000mJ/cm2 300nm 700nm PGMEA C 300nm 700nm Beer-Lambert [9] 2 SEM 10 5 2(a))

5 125-7 m (a) 125-7 125-9 (b) 140 C 10 2(d) 80 C 95 C N2 125-7 2 [10]( : tan ) (Eth) 125-7 15 110-7 140 C 2 125-7 2.

6 125-7 125-7 R(E) R E 2 125-7 110 C 140 C 80 C 95 C 3 Kd(nm/s) [11] 62lnRTEdTKdd= (1) E (kcal/mol) T (Kelvin) R ( ) (a) 5 500mJ/cm2 2000mJ/cm2 80 C 95 C 110 C 140 C 50mJ/cm2 140 C 80 C (b) (c)

7 7 9 2000mJ/cm2 80 C 95 C 110 C 140 C 50mJ/cm2 500mJ/cm2 140 C 80 C 2000mJ/cm2 80 C 95 C 110 C 140 C 4 420nm 80 C 95 C 11 110 C 125 C 140 C 0 80 C 95 C 110 C 140 C 4 (f) PGMEA PGMEA 420nm 97 N2 [4] (a)

8 80 C 1 5 GC-MS 80 C 95 C 11 110 C 140 C 0 3 7 Beer-Lambert [9] ltlog = (2) t ( ) l (cm) 6 5 80 C 95 C 110 C 140 C 95 C 110 C 80 C 95 C 11 110 C 140 C 0 110 C 140 C 0 95 C 160 g/mg 110 C 120 g/mg

9 80 C 95 C 110 C 140 C 7 110 C FT-IR 8 PGMEA PAGA-100 PGMEA 1736cm-1 9 N2 80 C 95 C N2 110 C 125 C 140 C N2 8 10 PAGA-100 2143cm-1 80 C 95 C 110 C 125 C 80 C 125 C 140 C 5 50 7 60 9 70 140 C 11

10 [12] (3) (g/cm Sec) k (cm2/Sec) d (cm) (dyne/cm) ( C) 80 C 95 C 110 C 125 C 140 C