Transcription of SEM-EDX AES -オージェ電子分光分析器- 最表面元素分析、 …
1 SEM-EDX - - X - . AES - - . XPS -X - . TOF-SIMS - 2 - .. FT-IR - - . IC - - . HPLC/LC-MS - - - . GC-MS - - - .. TOF-SIMS. IC LC-MS. AA. ICP GC-MS. GC.. AES. XPS LC. NMR. EPMA FT-IR. EDX.. FT-IR / .. cm cm--1 .. O-H 3570~3220.. N-H 3450~3120.. CO . CO 1750~1670. CN 2220. NO2 1540 1335. 1540 1335.. 10 m .. FT-IR .. ATR .. ATR.. CO . CO . NO2. HOOC . HOOC . CN. HO . HO .. NH2.. FT-IR .. IR Image 1644/1468 cm-1 IR Image 1084/1468 cm-1. Abs. Ratio = Abs. Ratio = . b . c . a .. 1644 1468 1084. a Absorbance b c . d(b-a). FT- IR 3000 2000 1500 1000. Wavenumbers (cm-1).. FT-IR . 10000 .. TFT .. TFT .. FTIR .. (a) . (b) IR image 1700cm-1 absorbance . (c) FT-IR . PET . / .. FT-IR .. 100% .. 100% .. 0 . 100% .. (a) FT-IR . (a) FT-IR .. 100% .. 780 850 cm-1 .. 100% . (b) 0 50 100.. 84% .. (b) FT-IR . SEM/EDS WDS.
2 SEM . EDS X WDS . X 2 . WDS EDS .. EDX WDX . WDS EDS .. X .. X . Si(Li).. X . P N .. WDS EDS .. X .. EDX 10 .. SEM-EDX .. SEM-EDX .. EDX .. EDX WDX Mo-S Mo-Cl .. Mo S. Cl K . EDS . L .. K .. Lg .. EDX,WDX Cu/Na . WDX. EDX. EDX,WDX Cu/Na . WDX. EDX.. GC-MS . GC-MS .. GC-MS .. HPLC/LC-MS . A. DAD1 B, Sig=210,10 Ref=360,50, TT (MT ). mAU. CH3. H2 H. Area: 15. 10 HO C O C C CH2. O. 5. CH3. 0. C18H20O3.. 16 18 20 22 24 26 28 30 32 34 min Exact Mass: DAD1 B, Sig=210,10 Ref=360,50, TT (HATTORI ). mAU. 20 S#: 1-42 RT: AV: 42 NL: T: - c Full m s [ - ].. 100. 15. 95. 90. 10 85. Area: 80. 75. 5. 70. 65. 0. Relative Abundance 60. 55. 16 18 20 22 24 26 28 30 32 34 min 50 45. 40 DAD1 B, Sig=210,10 Ref=360,50, TT (HATTORI ) 35. mAU. 30 . 25. 15 20 15. 10. 10. 5. 0. Area: 200 400 600 800 1000 1200 1400 1600 1800 2000.
3 5. m /z 0.. 16 18 20 22 24 26 28 30 32 34 min HPLC LC/MS .. IC . Cl SO4. F.
