CMOS Manufacturing Process

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Digital integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessCMOSManufacturingProcessDigital integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessCMOS ProcessDigital integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessA Modern CMOS Processp-welln-wellp+p-epiSiO2AlCupolyn+ SiO2p+gate-oxideTungstenTiSi2DualDual--W ell TrenchWell Trench--Isolated CMOS ProcessIsolated CMOS ProcessDigital integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessCircuit Under DesignThis two-inverter circuit (of Figure in the text) will bemanufactured in a twin-well integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessCircuit LayoutDigital integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessThe Manufacturing ProcessFor a great tour through the Process and its different steps, a complete walk-through of the Process (64 steps), check theBook web-pageDigital integrated CircuitsEE141Manufacturing ProcessManufacturing Processoxidationopticalmaskprocessstepph otoresistcoatingphotoresistremoval (ashing)spin, rinse, dryacid etchphotoresist stepper exposuredevelopmentTypical operations in a single photolithographic cycle (from [Fullman]).

Digital Integrated Circuits Manufacturing Process EE141 Circuit Under Design This two-inverter circuit (of Figure 3.25 in the text) will be manufactured in a twin-well process.

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