Transcription of CMOS Manufacturing Process
{{id}} {{{paragraph}}}
Digital integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOSM anufacturingProcessDigital integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOS ProcessDigital integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessA Modern CMOS Processp-welln-wellp+p-epiSiO2 AlCupolyn+SiO2p+gate-oxideTungstenTiSi2 DualDual--Well TrenchWell Trench--Isolated CMOS ProcessIsolated CMOS ProcessDigital integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit Under DesignThis two-inverter circuit (of Figure in the text) will bemanufactured in a twin-well integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit LayoutDigital integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessThe Manufacturing ProcessFor a great tour through the Process and its different steps, a complete walk-through of the Process (64 steps), check theBook web-pageDigital integrated CircuitsEE141 Manufacturing ProcessManufacturing Processoxidationopticalmaskprocessstepph otoresistcoatingphotoresistremoval (ashing)spin, rinse, dryacid etchphotoresist stepper exposuredevelopmentTypical operations in a single photolithographic cycle (from [Fullman]).
Digital Integrated Circuits Manufacturing Process EE141 Circuit Under Design This two-inverter circuit (of Figure 3.25 in the text) will be manufactured in a twin-well process.
Domain:
Source:
Link to this page:
Please notify us if you found a problem with this document:
{{id}} {{{paragraph}}}