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Chapter 1 Introduction to Chemical Vapor Deposition (CVD)

2001 ASM International. All Rights Reserved. Chemical Vapor Deposition (#06682G). Chapter 1. Introduction to Chemical Vapor Deposition (CVD). J. R. Creighton and P. Ho Sandia National Laboratories Box 5800, MS0601. Albuquerque, NM 87185-0601. Introduction The handbook by Pierson3 contains a very useful discussion of specific materials and CVD. Chemical Vapor Deposition (CVD) is a processes, as does the book by The widely used materials-processing technology. books by Hitchman and Jensen, 5 and by The majority of its applications involve applying Sherman, 6 concentrate more on silicon solid thin - film coatings to surfaces, but it is also microelectronics applications, while the books used to produce high-purity bulk materials and by Stringfellow7 and by Jones and O'Brien8.

method for depositing thin films. One of the primary advantages is that CVD films are generally quite conformal, i.e., that the film thickness on the sidewalls of features is comparable to the thickness on the top. This means that films can be applied to elaborately shaped pieces, including the insides and undersides of features, and that high ...

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