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Chapter 7 Plasma Basics - ntut.edu.tw

12006/4/121 Chapter 7 Plasma Basics2006/4/122 Objectives List at least three IC processes using Plasma Name three important collisions in Plasma Describe mean free path Explain how Plasma enhance etch and CVDprocesses Name two high density Plasma sources22006/4/123 Topics of Discussion What is Plasma ? Why use Plasma ? Ion bombardment Application of Plasma process2006/4/124 Applications of Plasma CVD Etch PVD Ion Implantation Photoresist strip Process chamber dry clean32006/4/125 What Is Plasma A Plasma is a ionized gas with equal numbersof positive and negative charges. A more precise definition:a Plasma is a quasi-neutral gas of charged and neutral particleswhich exhibits collective behavior. Examples:Sun, flame, neon light, of Plasma A Plasma consists of neutral atoms ormolecules, negative charges (electrons) andpositive charges (ions) Quasi-neutral:ni ne Ionization rate: ne/(ne+nn)42006/4/127 Neutral Gas Density Idea gas 1 mole = Litter = 104cm3 1 mole = 1023molecules At 1 atm, gas density is 1019cm 3 At 1 Torr, gas density is 1016cm 3 A

1 2006/4/12 1 Chapter 7 Plasma Basics 2006/4/12 2 Objectives •List at least three IC processes using plasma •Name three important collisions in plasma

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