Transcription of CMOS Manufacturing Process
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Digital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOSM anufacturingProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOS ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessA Modern cmos Processp-welln-wellp+p-epiSiO2 AlCupolyn+SiO2p+gate-oxideTungstenTiSi2 DualDual--Well TrenchWell Trench--Isolated cmos ProcessIsolated cmos ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit Under DesignThis two-inverter circuit (of Figure in the text) will bemanufactured in a twin-well Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit LayoutDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessThe Manufacturing ProcessFor a great tour through the Process and its different steps, a complete walk-through of the Process (64 steps), check theBook web-pageDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing Processoxidationopticalmaskprocessstepph otoresistcoatingphotoresistremoval (ashing)spin, rinse, dryacid etchphotores
development Typical operations in a single photolithographic cycle (from [Fullman]). Photo-Lithographic Process. Digital Integrated Circuits Manufacturing Process EE141 Patterning of SiO2 Si-substrate Si-substrate Si-substrate (a) Silicon base material (b) After oxidation and deposition
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