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CMOS Manufacturing Process

Digital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOSM anufacturingProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOS ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessA Modern CMOS Processp-welln-wellp+p-epiSiO2 AlCupolyn+SiO2p+gate-oxideTungstenTiSi2 DualDual--Well TrenchWell Trench--Isolated CMOS ProcessIsolated CMOS ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit Under DesignThis two-inverter circuit (of Figure in the text) will bemanufactured in a twin-well Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit LayoutDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessThe Manufacturing ProcessFor a great tour through the Process and its different steps, a complete walk-through of the Process (64 steps), check theBook web-pageDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing Processoxidationopticalmaskprocessstepph otoresistcoatingphotoresistremoval (ashing)spin, rinse, dryacid etchphotoresist stepper exposuredevelopmentTypical operations in a single photolithographic cycle (from [Fullman]).

Digital Integrated Circuits Manufacturing Process EE141 A Modern CMOS Process p-well n-well p+ p-epi SiO 2 AlCu poly n+ SiO 2 p+ gate-oxide Tungsten TiSi 2 ... Transistor Layout 1 2 5 3 T r a n s i s t o r. Digital Integrated Circuits Manufacturing Process EE141 Vias and Contacts 1 2 1 Via Metal to Metal to Poly Contact Active Contact 1 2 5 4 3 ...

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