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CMOS Manufacturing Process

Digital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOSM anufacturingProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCMOS ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessA Modern CMOS Processp-welln-wellp+p-epiSiO2 AlCupolyn+SiO2p+gate-oxideTungstenTiSi2 DualDual--Well TrenchWell Trench--Isolated CMOS ProcessIsolated CMOS ProcessDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit Under DesignThis two-inverter circuit (of Figure in the text) will bemanufactured in a twin-well Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessCircuit LayoutDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing ProcessThe Manufacturing ProcessFor a great tour through the Process and its different steps, a complete walk-through of the Process (64 steps), check theBook web-pageDigital Integrated CircuitsEE141 Manufacturing ProcessManufacturing Processoxida

(a) Silicon base material (b) After oxidation and deposition of negative photoresist (c) Stepper exposure Photoresist SiO 2 UV-light Patterned optical mask Exposed resist SiO 2 Si-substrate Si-substrate Si-substrate SiO 2 SiO 2 (d) After development and etching of resist, chemical or plasma etch of SiO 2 (e) After etching (f) Final result after ...

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