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CMOS Manufacturing Process

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Digital Integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessCMOSManufacturingProcessDigital Integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessCMOS ProcessDigital Integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessA Modern CMOS Processp-welln-wellp+p-epiSiO2AlCupolyn+ SiO2p+gate-oxideTungstenTiSi2DualDual--W ell TrenchWell Trench--Isolated CMOS ProcessIsolated CMOS ProcessDigital Integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessCircuit Under DesignThis two-inverter circuit (of Figure in the text) will bemanufactured in a twin-well Integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessCircuit LayoutDigital Integrated CircuitsEE141Manufacturing ProcessManufacturing ProcessThe Manufacturing ProcessFor a great tour through the Process and its different steps, a complete walk-through of the Process (64 steps), check theBook web-pageDigital Integrated CircuitsEE141Manufacturing ProcessManufacturing Processoxidationoptica

(a) Silicon base material (b) After oxidation and deposition of negative photoresist (c) Stepper exposure Photoresist SiO 2 UV-light Patterned optical mask Exposed resist SiO 2 Si-substrate Si-substrate Si-substrate SiO 2 SiO 2 (d) After development and etching of resist, chemical or plasma etch of SiO 2 (e) After etching (f) Final result after ...

  Process, Manufacturing, Silicon, Manufacturing process

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