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Interconnections: Silicides

EE 311 Prof SaraswatInterconnections: Silicides1. Source/Drain JunctionssourceRchSilicideRcRsdrainRdRd Rs metalXjPoly-SiR (total) = Rch + RparasiticRparasitic = Rextension + RextrinsicRextension = Rd + Rs Rextrinsic = Rd + Rs + 2Rc2. MOS Gate ElectrodeAs channel length is scaled, gate resistance increases. Gate electrode is also used asan interconnect layer in many applications. As channel length is scaled, gate resistanceincreasesEE 311 Prof Saraswat3. Local InterconnectTo minimize parasitic resistance we use silicide for:1. Polycide gate (silicide on polysilicon)2.

IEEE Transaction Electron Dev., November, 1983. ... • As deposited films have high resistivity because they are amorphous or microcrystalline and therefore carrier mobility is low

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