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MOS Capacitor - Chenming Hu

1575 MOS CapacitorCHAPTER OBJECTIVESThis chapter builds a deep understanding of the modern MOS(metal oxide semiconductor) structures. The key topics are the concepts of surfacedepletion, threshold, and inversion; MOS Capacitor C V; gate depletion; inversion-layerthickness; and two imaging devices charge-coupled device and CMOS(complementary MOS) imager. This chapter builds the foundation for understanding theMOSFETs (MOS field - effect Transistors).he acronym MOS stands for metal oxide semiconductor.

MOSFETs (MOS Field-Effect Transistors). he acronym MOS stands for metal–oxide–semiconductor. An MOS capacitor (Fig. 5–1) is made of a semiconductor b ody or substrate, an insulator film, such as SiO 2, and a metal electrode called a gate. The oxide film can be as thin as 1.5 nm. One nanometer is equal to 10 Å, or the size of a few oxide ...

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